Low temperature migration of silicon through metal films. Importance of silicon-metal interface : A. Hirakiet al. Phys. Status Solidi (a), 7 (2), October (1971), p. 401

• Book ID: 103268022
• Publisher: Elsevier Science
• Year: 1972
• Tongue: English
• Weight: 107 KB
• Volume: 11
• Category: Article
• ISSN: 0026-2714
• DOI: 10.1016/0026-2714(72)90091-1