558. Low-temperature migration of silicon through metal films. Importance of silicon-metal interface: A Hiraki et al, Phys Stat Sol (a), 7 (2), Oct 1971, 401–406

• Book ID: 103462707
• Publisher: Elsevier Science
• Year: 1972
• Tongue: English
• Weight: 160 KB
• Volume: 22
• Category: Article
• ISSN: 0042-207X
• DOI: 10.1016/0042-207x(72)90409-5