✦ LIBER ✦

Low temperature growth of reactive partially ionized beam deposited AlN films

✍ Scribed by Junqing Xie; Qingwei Mo; Jiayou Feng

No coin nor oath required. For personal study only.

📜 SIMILAR VOLUMES

Reactive partially ionized beam depositi

✍ Jiayou Feng; Junqing Xie; Qingwei Mo 📂 Article 📅 1997 🏛 Elsevier Science 🌐 English ⚖ 325 KB

Growth dynamics of reactive-sputtering-d

✍ Auger, M. A.; VaÌzquez, L.; SaÌnchez, O.; Jergel, M.; Cuerno, R.; Castro, M. 📂 Article 📅 2005 🏛 American Institute of Physics 🌐 English ⚖ 507 KB

The structure of aluminum films deposite

✍ Fionova, L.K.; Kononenko, O.V.; Matveev, V.N. 📂 Article 📅 1992 🏛 Elsevier Science ⚖ 502 KB

Growth of CN films by reactive ionized c

✍ Jiayou Feng; Chunping Long; Yi Zheng; Fangwei Zhang; Yudian Fan 📂 Article 📅 1995 🏛 Elsevier Science 🌐 English ⚖ 336 KB

Low temperature homo- and hetero-epitaxy

✍ H. Hirayama; G.H. Takaoka; H. Usui; I. Yamada 📂 Article 📅 1991 🏛 Elsevier Science 🌐 English ⚖ 362 KB

Low temperature growth of r.f. reactivel

✍ M. Penza; M.F. De Riccardis; L. Mirenghi; M.A. Tagliente; E. Verona 📂 Article 📅 1995 🏛 Elsevier Science 🌐 English ⚖ 690 KB