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Low temperature growth of polycrystalline indium phosphide

โœ Scribed by J.N. Roy; S. Basu; D.N. Bose


Publisher
Elsevier Science
Year
1981
Weight
214 KB
Volume
5
Category
Article
ISSN
0165-1633

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๐Ÿ“œ SIMILAR VOLUMES


Growth of large indium phosphide crystal
โœ D. Rumsby; R.M. Ware; M. Whitaker ๐Ÿ“‚ Article ๐Ÿ“… 1981 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 748 KB
Very low temperature growth of polycryst
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We have studied the growth of polycrystalline silicon by remote plasma chemical vapor deposition using a SiFd/Hz mixture at a low temperature of 1OO'C. Thin film is composed of grains in which there are many small sub-grains of less than IOnm. The film exhibited the polycrystalline volume fraction o