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Low temperature growth of homoepitaxial film on Si substrate cleanedin-situby ECR hydrogen plasma

✍ Scribed by H. W. Kim; W. S. Hwang; C. Lee; R. Reif

Book ID: 111543597
Publisher: Springer
Year: 2003
Tongue: English
Weight: 216 KB
Volume: 22
Category: Article
ISSN: 0261-8028
DOI: 10.1023/a:1024623804920

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