✦ LIBER ✦
Epitaxial growth of AlN films on Si substrates by ECR plasma assisted MOCVD under controlled plasma conditions in afterglow region
✍ Scribed by Kanji Yasui; Suguru Hoshino; Tadashi Akahane
- Book ID
- 108416162
- Publisher
- Elsevier Science
- Year
- 2000
- Tongue
- English
- Weight
- 625 KB
- Volume
- 159-160
- Category
- Article
- ISSN
- 0169-4332
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