Low temperature fabrication of 5–10 nm SiO2/Si structure using advanced nitric acid oxidation of silicon (NAOS) method

✍ Scribed by Yousuke Fukaya; Takashi Yanase; Yasushi Kubota; Shigeki Imai; Taketoshi Matsumoto; Hikaru Kobayashi

• Publisher: Elsevier Science
• Year: 2010
• Tongue: English
• Weight: 404 KB
• Volume: 256
• Category: Article
• ISSN: 0169-4332
• DOI: 10.1016/j.apsusc.2010.03.032