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Low-temperature epitaxial growth of doped silicon films and junctions : R. N. Thomas and M. H. Francombe, Solid-St. Electron.12 (1969), p. 799

Publisher: Elsevier Science
Year: 1970
Tongue: English
Weight: 114 KB
Volume: 9
Category: Article
ISSN: 0026-2714
DOI: 10.1016/0026-2714(70)90399-9

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📂 Article 📅 1970 🏛 Elsevier Science 🌐 English ⚖ 105 KB