Low-temperature epitaxial crystallization of amorphous GexSi1−x and NiSi2 layers on Si induced by ion irradiation

✍ Scribed by M.C. Ridgway; R.G. Elliman; J.S. Williams

• Book ID: 113280609
• Publisher: Elsevier Science
• Year: 1990
• Tongue: English
• Weight: 448 KB
• Volume: 48
• Category: Article
• ISSN: 0168-583X
• DOI: 10.1016/0168-583x(90)90159-r