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Low temperature direct imprint of polyhedral oligomeric silsesquioxane (POSS) resist

✍ Scribed by Nikolaos Kehagias; Marc Zelsmann; Mustapha Chouiki; Achille Francone; Vincent Reboud; Rainer Schoeftner; Clivia Sotomayor Torres

No coin nor oath required. For personal study only.

📜 SIMILAR VOLUMES

Polyhedral oligomeric silsesquioxane (PO

✍ E. Tegou; V. Bellas; E. Gogolides; P. Argitis 📂 Article 📅 2004 🏛 Elsevier Science 🌐 English ⚖ 228 KB

Synthesis of Aromatic Polyhedral Oligome

✍ Vandana Vij, Timothy S. Haddad, Gregory R. Yandek, Sean M. Ramirez, Joseph M. Ma 📂 Article 📅 2012 🏛 Springer Netherlands 🌐 English ⚖ 980 KB

Properties and performance of fire resis

✍ Terese E. Glodek; Steven E. Boyd; Ian M. McAninch; John J. LaScala 📂 Article 📅 2008 🏛 Elsevier Science 🌐 English ⚖ 429 KB

Fabrication of Hierarchically Ordered Hy

✍ Hayakawa, Teruaki; Seino, Makoto; Goseki, Raita; Hirai, Tomoyasu; Kikuchi, Ryohe 📂 Article 📅 2006 🏛 Nature Publishing Group 🌐 English ⚖ 499 KB

Synthesis of poly(4-vinylphenol) (PVPh)

✍ Chun-Hsiung Liao; Fu-Ming Chien; Chen-Ming Chen; Lung-Chang Liu; Ming-Hua Chung; 📂 Article 📅 2011 🏛 Elsevier Science 🌐 English ⚖ 364 KB