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Low-temperature deposition of diamond using chloromethane in a hot-filament chemical vapor deposition reactor

✍ Scribed by Hong, Franklin Chau-Nan; Hsieh, Jing-Chuang; Wu, Jih-Jen; Liang, Gou-Tsau; Hwang, Jen-Haw

No coin nor oath required. For personal study only.

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