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Low-temperature crystallization of amorphous Si films using AlCl3 vapor

โœ Scribed by Jin Hyung Ahn; Ji Hye Eom; Kyung Hoon Yoon; Byung Tae Ahn

Book ID
108472358
Publisher
Elsevier Science
Year
2002
Tongue
English
Weight
227 KB
Volume
74
Category
Article
ISSN
0927-0248

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๐Ÿ“œ SIMILAR VOLUMES

Microwave-induced low-temperature crysta
Microwave-induced low-temperature crystallization of amorphous Si thin films
โœ Jin Hyung Ahn; Jeong No Lee; Yoon Chang Kim; Byung Tae Ahn ๐Ÿ“‚ Article ๐Ÿ“… 2002 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 158 KB

Microwave heating was utilized for low-temperature crystallization of amorphous Si (a-Si) films. Microwave heating lowered the annealing temperature and reduced the annealing time. By microwave heating the hydrogen in the amorphous films was diffused out long before the nucleation of polycrystalline