Low-frequency noise sources in polysilicon emitter BJT's: influence of hot-electron-induced degradation and post-stress recovery

✍ Scribed by Mounib, A.; Balestra, F.; Mathieu, N.; Brini, J.; Ghibaudo, G.; Chovet, A.; Chantre, A.; Nouailhat, A.

• Book ID: 114536156
• Publisher: IEEE
• Year: 1995
• Tongue: English
• Weight: 602 KB
• Volume: 42
• Category: Article
• ISSN: 0018-9383
• DOI: 10.1109/16.405279