Low-damage plasma processing of polymers for development of organic-inorganic flexible devices
β Scribed by Yuichi Setsuhara; Ken Cho; Kosuke Takenaka; Masaharu Shiratani; Makoto Sekine; Masaru Hori
- Publisher
- Elsevier Science
- Year
- 2010
- Tongue
- English
- Weight
- 640 KB
- Volume
- 205
- Category
- Article
- ISSN
- 0257-8972
No coin nor oath required. For personal study only.
β¦ Synopsis
Plasma generation and control technologies for processing of polymers have been developed with multiple low-inductance antenna (LIA) units, as a promising candidate for next-generation processing of hybrid flexible devices. Properties of argon-oxygen mixture plasmas sustained with multiple LIA units have been investigated in terms of ion energies bombarding onto polymer surface. Ion energy distribution at the sheath edge of the argon-oxygen mixture plasmas showed considerable suppression of ion energies as small as or less than 10 eV. Effects of the plasma exposure onto polymers have been examined using hard x-ray photoelectron spectroscopy (HXPES) in terms of chemical bonding states of the polymer surface and the interface between polymer and silicon film.
π SIMILAR VOLUMES
A low pressure plasma process was used in the laboratory to synthesize very pure Sr-doped LaMnO 3 porous layers, which could be used as a SOFC cathode. Recent experimental work allowed to adapt the process to synthesize both the YSZ dense electrolyte and the NiO-YSZ porous anode in one step. The raw