Location of trapped charge in aluminum-implanted SiO2: D. J. DiMaria, D. R. Young, W. R. Hunter and C. M. Serrano. IBM J. Res. Dev. 22, (3) 289 (May 1978)

• Publisher: Elsevier Science
• Year: 1978
• Tongue: English
• Weight: 64 KB
• Volume: 18
• Category: Article
• ISSN: 0026-2714
• DOI: 10.1016/0026-2714(78)90569-3