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Local material removal by focused ion beam milling and etching

โœ Scribed by S. Lipp; L. Frey; G. Franz; E. Demm; S. Petersen; H. Ryssel


Book ID
113286873
Publisher
Elsevier Science
Year
1995
Tongue
English
Weight
476 KB
Volume
106
Category
Article
ISSN
0168-583X

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Highly (0 0 2)-oriented AlN film was deposited on n-type (1 0 0)-oriented silicon substrates by the radio frequency magnetron sputtering method. An individual AlN cone with high aspect ratio was fabricated by the focused ion-beam (FIB) etching process in the surface of an as-formed AlN film. This et