Loading effect and temperature dependence of etch rate of silicon materials in CF4 plasma: T. Enomoto Solid-St. Technol. 117 (April 1980)

• Book ID: 108361090
• Publisher: Elsevier Science
• Year: 1981
• Tongue: English
• Weight: 140 KB
• Volume: 12
• Category: Article
• ISSN: 0026-2692
• DOI: 10.1016/s0026-2692(81)80184-x