Loading effect and temperature dependence of etch rate of silicon materials in CF4 plasma : Tatsuya Enomoto. Solid-St. Technol. 117 (April 1980)

• Book ID: 103275384
• Publisher: Elsevier Science
• Year: 1980
• Tongue: English
• Weight: 134 KB
• Volume: 20
• Category: Article
• ISSN: 0026-2714
• DOI: 10.1016/0026-2714(80)90136-5