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Limitations in the methods of determination of conduction mechanisms in high-permittivity dielectric nano-layers

✍ Scribed by N. Novkovski

Publisher
Elsevier Science
Year
2007
Tongue
English
Weight
185 KB
Volume
398
Category
Article
ISSN
0921-4526

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✦ Synopsis

The standard methods of determination of the dominant conduction mechanisms in high-permittivity dielectrics were discussed for the case of very thin films. The outcomes from the estimation method were tested on the theoretical results obtained by the use of a comprehensive model describing the I-V characteristics of Ta 2 O 5 /SiO 2 stacked layers. It is shown that the standard method based on the determination of a slope in Poole-Frenkel plot provides only a rough estimation that may lead in some cases to essentially incorrect results. The observed disagreement is explained by the modifications induced by the presence of an unavoidably grown SiO 2 -like few nanometers thick interfacial layer.

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On the measurement of the complex permit
On the measurement of the complex permittivity of layers embedded in a multilayered dielectric material with the use of a free-space method
✍ Israel Garcia-Ruiz; Carlos D. Aviles-Castro; Hildeberto JardΓ³n-Aguilar; Juan Gue πŸ“‚ Article πŸ“… 2002 πŸ› John Wiley and Sons 🌐 English βš– 218 KB

## Abstract Free‐space method approaches for obtaining the complex permittivity of dielectric layers embedded in a multilayer dielectric material are investigated. Solids, liquids, and granular materials have been tested; a description of the de‐embedding process is presented in detail, as are the