Effect of hydrogen dilution in silane on
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P.K. Acharya; H.D. Banerjee; K.L. Chopra; S.C. Saha; Swati Ray
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Article
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1994
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Elsevier Science
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English
β 362 KB
Hydrogenated amorphous silicon films (a-Si:H) have been deposited by r.f. glow discharge of silane (Sill 4) and hydrogen (H 2) gas mixture. The hydrogen concentration in the gas mixture and the applied r.f. power density have been varied. The initial photoconductivity (crp), photosensitivity (%/~d),