Laser-induced metal deposition on semiconductors from liquid electrolytes
✍ Scribed by NaÌnai, L.; Hevesi, I.; Bunkin, F. V.; Lukâyanchuk, B. S.; Brook, M. R.; Shafeev, G. A.; Jelski, Daniel A.; Wu, Z. C.; George, Thomas F.
- Book ID
- 120575862
- Publisher
- American Institute of Physics
- Year
- 1989
- Tongue
- English
- Weight
- 603 KB
- Volume
- 54
- Category
- Article
- ISSN
- 0003-6951
- DOI
- 10.1063/1.100877
No coin nor oath required. For personal study only.
📜 SIMILAR VOLUMES
The possibility of the copper precipitation from the CuCl~2~-based liquid electrolyte precursor on the SiO~2~ substrates with Laser-induced Chemical Liquid phase Deposition (LCLD) method has been demonstrated. Focused beam of the CW Ar^+^ laser generated in multiwave regime was used for the initiati
The copper spots were precipitated on the SiO~2~ substrates with Laser-induced Chemical Liquid phase Deposition (LCLD) method. The focused beam of the CW Ar^+^ laser generated in the multiwave regime was used for the metal precipitation. The deposition process was initiated by a laser-assisted photo