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Laser-assisted metal deposition from CuSO4-based electrolyte solution

โœ Scribed by A. Manshina; A. Povolotskiy; T. Ivanova; A. Kurochkin; Yu. Tver'yanovich; D. Kim; M. Kim; S.C. Kwon


Publisher
John Wiley and Sons
Year
2007
Tongue
English
Weight
119 KB
Volume
4
Category
Article
ISSN
1612-2011

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โœฆ Synopsis


The copper spots were precipitated on the SiO~2~ substrates with Laser-induced Chemical Liquid phase Deposition (LCLD) method. The focused beam of the CW Ar^+^ laser generated in the multiwave regime was used for the metal precipitation. The deposition process was initiated by a laser-assisted photothermal chemical reaction, which results in the reduction of the metal complexes to the metal. To minimize the negative influence of the bubbles formation phenomenon the ``substrate-side'' geometry of the metal deposition has been suggested. The dependence of the metal precipitation process on the laser power and the deposition time was studied. Laser power 240 mW was found to be the threshold value for the metal deposition from the CuSO~4~-based electrolyte solution at the temperature 298 K.


๐Ÿ“œ SIMILAR VOLUMES


CuCl2-based liquid electrolyte precursor
โœ A. Manshina; A. Povolotskiy; T. Ivanova; A. Kurochkin; Yu. Tver'yanovich; D. Kim ๐Ÿ“‚ Article ๐Ÿ“… 2007 ๐Ÿ› John Wiley and Sons ๐ŸŒ English โš– 707 KB

The possibility of the copper precipitation from the CuCl~2~-based liquid electrolyte precursor on the SiO~2~ substrates with Laser-induced Chemical Liquid phase Deposition (LCLD) method has been demonstrated. Focused beam of the CW Ar^+^ laser generated in multiwave regime was used for the initiati