✦ LIBER ✦

Laser-induced formation of titanium silicides

✍ Scribed by Chen, S. Y.; Shen, Z. X.; Chen, Z. D.; See, A. K.; Chan, L. H.; Zhang, T. J.; Tee, K. C.

Publisher: John Wiley and Sons
Year: 1999
Tongue: English
Weight: 194 KB
Volume: 28
Category: Article
ISSN: 0142-2421
DOI: 10.1002/(sici)1096-9918(199908)28:1<200::aid-sia607>3.0.co;2-2

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✦ Synopsis

In this article, we report on the laser-induced formation of both C49 and C54 TiSi 2 films with fine grains using Q-switched Nd : YAG laser irradiation from Ti/Si samples. The films formed were characterized with micro-Raman spectroscopy, high-resolution transmission electron microscopy, energy-dispersive spectrometry and atomic force microscopy. The TiSi 2 films synthesized are single-phased and thin, with fine grains and a smooth film/substrate interface on the atomic scale. The process is likely to proceed via a solid-state reaction rather than liquid-phase intermixing. Our results demonstrate the unique advantages of a laser annealing technique and its potential in deep submicron semiconductor technology.

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