Laser direct writing of tin oxide patterns

✍ Scribed by T Szörényi; Zs Geretovszky; J Tóth; A Simon; Cs Cserháti

• Book ID: 104266031
• Publisher: Elsevier Science
• Year: 1998
• Tongue: English
• Weight: 411 KB
• Volume: 50
• Category: Article
• ISSN: 0042-207X
• DOI: 10.1016/s0042-207x(98)00063-3

✦ Synopsis

Tin oxide pattern generation by laser deposition from SnCl 4 • 5H 2 O in isopropanol is reported. Smooth, even stripes of thicknesses ranging from 20 to 120 nm with sharp, well defined edges and cross-section are deposited by scanning Ar + laser beam (l = 514.5 nm) focused onto the substrate-solution interface with a constant speed of 1 mm s -1 . The linewidth linearly increases from 26 to 42 mm with increasing the power from 40 to 120 mW. The reproducibility of pattern generation is extremely good as revealed by SEM-EDXI and mRBS. The minimum DC resistivity of 1.7×10 -2 Vcm, measured without any process optimization, favourably compares with those reported for films prepared by other techniques. The chemical composition of the film material is SnO x with 1.1 ³ x ³ 1.5 as determined by an XPS-XAES study.