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Langmuir-Blodgett resist films for microlithography by exposure to a scanning electron microscope

✍ Scribed by W. Lu; N. Gu; Z.H. Lu; X.M. Yang; Y. Wei; H.Y. Shen; L. Zhang

Book ID: 103428503
Publisher: Elsevier Science
Year: 1994
Tongue: English
Weight: 369 KB
Volume: 242
Category: Article
ISSN: 0040-6090
DOI: 10.1016/0040-6090(94)90525-8

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