The gas-phase decompositions of methylsilane and methylsilane-d3 have been investigated in a single-pulse shock tube at 4700 torr total pressure in the temperature range of 1125-1250 K. For CH3SiD3 at 1200 K three primary steps occur in the homogeneous decomposition with efficiencies in parentheses:
Kinetics of the silane and silylene decompositions under shock tube conditions
โ Scribed by Newman, Charles G.; Ring, Morey A.; O'Neal, H. Edward
- Book ID
- 126876970
- Publisher
- American Chemical Society
- Year
- 1978
- Tongue
- English
- Weight
- 278 KB
- Volume
- 100
- Category
- Article
- ISSN
- 0002-7863
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๐ SIMILAR VOLUMES
The shock-induced thermal decompositions of vinylsilane and vinylsilane-d, (0.2% on argon) have been studied in the temperature range of 1085-1275 K, and at total pressures of about 3100 tom. In systems without silylene traps, some induced decomposition occurs which is attributed to the silylene cha
## Abstract The thermal decomposition of gaseous monomethylhydrazine (MMH) was studied by recording MMH absorption at 220 nm of the reacting gas behind a reflected shock wave at temperatures of 900โ1370 K, pressures of 140โ450 kPa, and in mixtures containing 97.5โ99 mol% argon. Based on previous wo
The homogeneous gas-phase decomposition kinetics of silane has been investigated using the single-pulse shock tube comparative rate technique (T = 1035-1184ยฐK, P ~d = 4000 Torr). The initial reaction of the decomposition SiH4 ! + SiHz + H2 is a unimolecular process in its pressure fall-off regime w