## Abstract Rate constants were determined for the reactions of OH radicals with halogenated cyclobutanes cyclo‐CF~2~CF~2~CHFCH~2~(__k__~1~), __trans__‐cyclo‐CF~2~CF~2~CHClCHF(__k__~2~), cyclo‐CF~2~CFClCH~2~CH~2~(__k__~3~), __trans__‐cyclo‐CF~2~CFClCHClCH~2~(__k__~4~), and __cis__‐cyclo‐CF~2~CF
Kinetics of the gas-phase reactions of CHXCFX (X = H, F) with OH (253–328 K) and NO3 (298 K) radicals and O3 (236–308 K)
✍ Scribed by L. Chen; T. Uchimaru; S. Kutsuna; K. Tokuhashi; A. Sekiya
- Publisher
- John Wiley and Sons
- Year
- 2010
- Tongue
- English
- Weight
- 359 KB
- Volume
- 42
- Category
- Article
- ISSN
- 0538-8066
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✦ Synopsis
Abstract
Rate constants for the reactions of OH and NO~3~ radicals with CH~2~CHF (k~1~ and k~4~), CH~2~CF~2~ (k~2~ and k~5~), and CHFCF~2~ (k~3~ and k~6~) were determined by means of a relative rate method. The rate constants for OH radical reactions at 253–328 K were k~1~ = (1.20 ± 0.37) × 10^−12^ exp[(410 ± 90)/T], k~2~ = (1.51 ± 0.37) × 10^−12^ exp[(190 ± 70)/T], and k~3~ = (2.53 ± 0.60) × 10^−12^ exp[(340 ± 70)/T] cm^3^ molecule^−1^ s^−1^. The rate constants for NO~3~ radical reactions at 298 K were k~4~ = (1.78 ± 0.12) × 10^−16^ (CH~2~CHF), k~5~ = (1.23 ± 0.02) × 10^−16^ (CH~2~CF~2~), and k~6~ = (1.86 ± 0.09) × 10^−16^ (CHFCF~2~) cm^3^ molecule^−1^ s^−1^. The rate constants for O~3~ reactions with CH~2~CHF (k~7~), CH~2~CF~2~ (k~8~), and CHFCF~2~ (k~9~) were determined by means of an absolute rate method: k~7~ = (1.52 ± 0.22) × 10^−15^ exp[−(2280 ± 40)/T], k~8~ = (4.91 ± 2.30) × 10^−16^ exp[−(3360 ± 130)/T], and k~9~ = (5.70 ± 4.04) × 10^−16^ exp[−(2580 ± 200)/T] cm^3^ molecule^−1^ s^−1^ at 236–308 K. The errors reported are ±2 standard deviations and represent precision only. The tropospheric lifetimes of CH~2~CHF, CH~2~CF~2~, and CHFCF~2~ with respect to reaction with OH radicals, NO~3~ radicals, and O~3~ were calculated to be 2.3, 4.4, and 1.6 days, respectively. © 2010 Wiley Periodicals, Inc. Int J Chem Kinet 42: 619–628, 2010
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## Abstract The rate constants, __k__~1~, of the reaction of CF~3~OC(O)H with OH radicals were measured by using a Fourier transform infrared spectroscopic technique in an 11.5‐dm^3^ reaction chamber at 242–328 K. OH radicals were produced by UV photolysis of an O~3~–H~2~O–He mixture at an initial
## Abstract Rate constants for the gas‐phase reactions of CH~3~OCH~2~CF~3~ (__k__~1~), CH~3~OCH~3~ (__k__~2~), CH~3~OCH~2~CH~3~ (__k__~3~), and CH~3~CH~2~OCH~2~CH~3~ (__k__~4~) with NO~3~ radicals were determined by means of a relative rate method at 298 K. NO~3~ radicals were prepared by thermal d
Using relative rate methods, rate constants have been measured for the gas-phase reactions of 3-methylfuran with NO, radicals and 0, at 296 ? 2 K and atmospheric pressure of air. The rate constants determined were (1.31 ? 0.46) X lo-'' cm' molecule-' s-' for the NO, radical reaction and (2.05 ? 0.52
The kinetics of the gas-phase reactions of OH radicals, NO 3 radicals, and O 3 with indan, indene, fluorene, and 9,10-dihydroanthracene have been studied at 297 Ϯ 2 K and atmospheric pressure of air. The rate constants, or upper limits thereof, for the O 3 reactions were (in cm 3 molecule Ϫ1 s Ϫ1 un
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