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Kinetics of the ferroelectrical behaviour of a thin layer of phase III KNO3

✍ Scribed by F. El-Kabbany; M.M. Abdel-Kader; M. Tosson; E. El-Khwass


Publisher
Elsevier Science
Year
1995
Tongue
English
Weight
351 KB
Volume
256
Category
Article
ISSN
0040-6031

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The gas-phase decomposition of methylsil
✍ B. A. Sawrey; H. E. O'Neal; M. A. Ring; D. Coffey Jr. πŸ“‚ Article πŸ“… 1984 πŸ› John Wiley and Sons 🌐 English βš– 444 KB πŸ‘ 1 views

The homogeneous gas-phase decomposition kinetics of methylsilane and methylsilane-d3 have been investigated by the comparative-rate-single-pulse shock-tube technique a t total pressures of 4700 torr in the 1125-1250 K temperature range. Three primary processes occur: CH:$iH3 -CH3SiH + HS (l), CH3SiH