✦ LIBER ✦

Kinetics of dissolution of silicon in CrO3-HF-H2O solutions

✍ Scribed by Robert B. Heimann

Book ID: 105078940
Publisher: Springer
Year: 1984
Tongue: English
Weight: 831 KB
Volume: 19
Category: Article
ISSN: 0022-2461
DOI: 10.1007/bf01120043

No coin nor oath required. For personal study only.

📜 SIMILAR VOLUMES

Dissolution of silicon and junction deli

Dissolution of silicon and junction delineation in silicon by the CrO3-HF-H2O system

✍ T.L. Chu; J.R. Gavaler 📂 Article 📅 1965 🏛 Elsevier Science 🌐 English ⚖ 611 KB

The dissolution of single crystal silicon by aqueous solutions' of hydrofluoric acid and chromium (VI) oxide was studied as a function of the resistivity of silicon and the composition of the etchant . In the concentration range under study, the dissolution rate is dependent on the resistivity of th

Ultrasonic etching of GaAs in CrO3-HF aq

Ultrasonic etching of GaAs in CrO3-HF aqueous solutions

✍ Nuofu Chen 📂 Article 📅 1993 🏛 Elsevier Science 🌐 English ⚖ 423 KB

Dissolution kinetics of zircaloy in HNO3

Dissolution kinetics of zircaloy in HNO3/HF mixtures

✍ Z. Goncalves; H. Münzel 📂 Article 📅 1990 🏛 Elsevier Science 🌐 English ⚖ 797 KB

Dissolution and passivity of nickel in H

Dissolution and passivity of nickel in HF + H2O + HCl system

✍ Ch. Comninellis; E. Plattner 📂 Article 📅 1979 🏛 Elsevier Science 🌐 English ⚖ 126 KB

Spectrum of low frequencies in H2O, D2O

Spectrum of low frequencies in H2O, D2O and solutions of HF in H2O

✍ H. Stiller 📂 Article 📅 1964 🏛 Elsevier Science ⚖ 346 KB

Kinetics and mechanism of dissolution of

Kinetics and mechanism of dissolution of bayerite (γ-Al(OH)3) in HNO3-HF solutions at 298.2°K

✍ Kurt Pulfer; Paul W Schindler; John C WestallRolf Grauer 📂 Article 📅 1984 🏛 Elsevier Science 🌐 English ⚖ 635 KB