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Dissolution and passivity of nickel in HF + H2O + HCl system

✍ Scribed by Ch. Comninellis; E. Plattner


Book ID
107748970
Publisher
Elsevier Science
Year
1979
Tongue
English
Weight
126 KB
Volume
24
Category
Article
ISSN
0013-4686

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Dissolution of silicon and junction deli
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The dissolution of single crystal silicon by aqueous solutions' of hydrofluoric acid and chromium (VI) oxide was studied as a function of the resistivity of silicon and the composition of the etchant . In the concentration range under study, the dissolution rate is dependent on the resistivity of th