Kinetic modeling of tungsten silicide chemical vapor deposition from WF6 and Si2H6: Determination of the reaction scheme and the gas-phase reaction rates

✍ Scribed by Takeyasu Saito; Keiji Oshima; Yukihiro Shimogaki; Yasuyuki Egashira; Katsuro Sugawara; Katsumi Takahiro; Shinji Nagata; Sadae Yamaguchi; Hiroshi Komiyama

• Book ID: 108087843
• Publisher: Elsevier Science
• Year: 2007
• Tongue: English
• Weight: 457 KB
• Volume: 62
• Category: Article
• ISSN: 0009-2509
• DOI: 10.1016/j.ces.2007.07.035