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[Japan Society of Applied Physics Digest of Papers. Microprocesses and Nanotechnology '99. 1999 International Microprocesses and Nanotechnology Conference - Yokohama, Japan (6-8 July 1999)] Digest of Papers. Microprocesses and Nanotechnology '99. 1999 International Microprocesses and Nanotechnology Conference - Lithographic performance of a chemically-amplified resist developed for synchrotron radiation lithography in the sub-100-nm region

✍ Scribed by Deguchi, K.; Nakamura, J.; Kawai, Y.; Ohno, T.; Fukuda, M.; Oda, M.; Kochiya, H.; Ushiyama, Y.; Hamada, H.; Shimizu, T.

Book ID: 126745083
Publisher: Japan Society of Applied Physics
Year: 1999
Weight: 292 KB
Category: Article
ISBN-13: 9784930813978
DOI: 10.1109/IMNC.1999.797453

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