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Iron contamination in silicon wafers measured with the pulsed MOS capacitor generation lifetime technique

โœ Scribed by Suat-Eng Tan; Schroder, D.K.; Kohno, M.; Miyazaki, M.


Book ID
114538479
Publisher
IEEE
Year
2000
Tongue
English
Weight
191 KB
Volume
47
Category
Article
ISSN
0018-9383

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