Iron contamination in silicon wafers measured with the pulsed MOS capacitor generation lifetime technique

✍ Scribed by Suat-Eng Tan; Schroder, D.K.; Kohno, M.; Miyazaki, M.

• Book ID: 114538479
• Publisher: IEEE
• Year: 2000
• Tongue: English
• Weight: 191 KB
• Volume: 47
• Category: Article
• ISSN: 0018-9383
• DOI: 10.1109/16.887027