IR, ESR and resistivity measurements on amorphous silicon oxi-nitride films prepared by PECVD at low temperature

✍ Scribed by Y. Cros; D. Jousse; J. Liu; J.C. Rostaing

• Book ID: 119444139
• Publisher: Elsevier Science
• Year: 1987
• Tongue: English
• Weight: 200 KB
• Volume: 90
• Category: Article
• ISSN: 0022-3093
• DOI: 10.1016/s0022-3093(87)80428-3