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XPS, ESR and resistivity measurements on amorphous silicon oxynitride films (a-SiOxNy) prepared by reactive evaporation of Si in presence of NO2

✍ Scribed by L. Kubler; R. Haug; F. Ringeisen; A. Jaegle


Book ID
118332010
Publisher
Elsevier Science
Year
1983
Tongue
English
Weight
667 KB
Volume
54
Category
Article
ISSN
0022-3093

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