RF-sputtered CrB2 diffusion barrier for
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W.T. Lim; P.W. Sadik; D.P. Norton; B.P. Gila; S.J. Pearton; I.I. Kravchenko; F.
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Article
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2008
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Elsevier Science
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English
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Ohmic contacts to p-type CuCrO 2 using Ni/Au/CrB 2 /Ti/Au contact metallurgy are reported. The samples were annealed in the 200-700 8C range for 60 s in flowing oxygen ambient. A minimum specific contact resistance of $2 ร 10 ร5 V cm 2 was obtained after annealing at 400 8C. Further increase in the