𝔖 Bobbio Scriptorium
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Ion milling (ion-beam etching), 1954–1975: a bibliography


Publisher
Elsevier Science
Year
1976
Tongue
English
Weight
140 KB
Volume
26
Category
Article
ISSN
0042-207X

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📜 SIMILAR VOLUMES


Deep reactive ion etching and focused io
✍ G. Villanueva; J.A. Plaza; A. Sánchez-Amores; J. Bausells; E. Martínez; J. Samit 📂 Article 📅 2006 🏛 Elsevier Science 🌐 English ⚖ 281 KB

We have studied the fabrication of high-aspect ratio silicon tips by a combination of deep reactive ion etching and focused ion beam. The reactive ion etching is used to obtain so-called "rocket tips" which can be fabricated with a high aspect ratio. The rocket tips are further processed by using a

Ion and electron beam deposited masks fo
✍ A. Notargiacomo; E. Giovine; L. Di Gaspare 📂 Article 📅 2011 🏛 Elsevier Science 🌐 English ⚖ 408 KB

We report on the use of a carbon-rich Pt-based material, obtained by electron and ion beam assisted deposition from metal-organic precursor, as a mask for pattern transfer processes. Thin and narrow mask patterns subjected to oxygen plasma and reactive ion etching (RIE) of silicon in SF 6 were inves