๐”– Bobbio Scriptorium
โœฆ   LIBER   โœฆ

Ion implanted microstructure barrier in CVD rhenium

โœ Scribed by K.T. Kim; G. Welsch

Book ID
119124510
Publisher
Elsevier Science
Year
1991
Tongue
English
Weight
575 KB
Volume
12
Category
Article
ISSN
0167-577X

No coin nor oath required. For personal study only.

๐Ÿ“œ SIMILAR VOLUMES

Ion implantation in predoped CVD diamond
Ion implantation in predoped CVD diamond
โœ H. Yagyu; M. Deguchi; Y. Mori; A. Hatta; T. Ito; M. Kitabatake; H. Sakakima; T. ๐Ÿ“‚ Article ๐Ÿ“… 1996 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 450 KB
Microstructure of ion-implanted region i
Microstructure of ion-implanted region in TiNi alloy
โœ Noriaki Ikenaga; Yoichi Kishi; Zenjiro Yajima; Noriyuki Sakudo; Shizuka Nakano; ๐Ÿ“‚ Article ๐Ÿ“… 2009 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 475 KB
Microstructural evolution in silicon imp
Microstructural evolution in silicon implanted with chlorine ions
โœ C.H. Zhang; T. Shibayama; Y.F. Jin; Y.T. Yang; L.H. Zhou; Y. Song ๐Ÿ“‚ Article ๐Ÿ“… 2007 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 619 KB

In the present work p-type Si specimens were implanted with Cl ions of 100 keV to successively increasing fluences of 1 โ€ข 10 15 , 5 โ€ข 10 15 , 1 โ€ข 10 16 and 5 โ€ข 10 16 ions cm ร€2 and subsequently annealed at 1073 K for 30 min. The microstructure was investigated with the transmission electron microsco