Ion Implantation Science and Technology
β J.F. Ziegler (Eds.)
π Library
π
1988
π Academic Press
π English
β¦ LIBER β¦
π
Ion Implantation Science and Technology
β Scribed by J.F. Ziegler (Eds.)
- Publisher
- Academic Press Inc
- Year
- 1984
- Tongue
- English
- Leaves
- 635
- Edition
- 0
- Category
- Library
β¬ Acquire This Volume
No coin nor oath required. For personal study only.
β¦ Table of Contents
Content:
Front Matter, Page iii
Copyright, Page iv
Dedication, Page v
Contributors, Pages ix-x
Preface, Page xi, J.F. ZIEGLER
THE HISTORICAL DEVELOPMENT OF ION IMPLANTATION, Pages 3-49, Lienhard Wegmann
THE STOPPING AND RANGE OF IONS IN SOLIDS, Pages 51-108, J.F. Ziegler
ION IMPLANTATION DAMAGE IN SILICON, Pages 109-138, Siegfried Madcr
DAMAGE ANNEALING IN SILICON AND ELECTRICAL ACTIVITY, Pages 139-210, Jozsef Gyulai
MEASUREMENT OF ELECTRICALLY ACTIVE DOPANTS, Pages 211-260, P.L.F. Hemment
ION IMPLANTATION METALLURGY, Pages 261-310, I.J.R. Baumvol
ION IMPLANTATION SYSTEM CONCEPTS, Pages 313-373, Hans Glawischnig, Klaus Noack
AN INTRODUCTION TO ION SOURCES, Pages 375-432, K.G. Stephens
SOME PRINCIPLES UNDERLYING ION OPTICS DESIGN, Pages 433-486, Kenneth H. Purser, J. Paul Farrell
MAPPING OF ION IMPLANTED WAFERS, Pages 487-536, Michael I. Current, Matthew J. Markert
MEASUREMENT AND CONTROL OF ION IMPLANTATION ACCELERATOR PARAMETERS, Pages 537-602, I.H. WILSON, K.M. BARFOOT
ION IMPLANTATION: SAFETY AND RADIATION CONSIDERATIONS, Pages 603-627, Heiner Ryssel, Karl Haberger
Index, Pages 629-635
Inside Back Cover, Page 636
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