Ion Implantation Science and Technology
β J.F. Ziegler (Eds.)
π Library
π
1984
π Academic Press Inc
π English
β¦ LIBER β¦
π
Ion Implantation Science and Technology
β Scribed by J.F. Ziegler (Eds.)
- Publisher
- Academic Press
- Year
- 1988
- Tongue
- English
- Leaves
- 492
- Edition
- 2 Sub
- Category
- Library
β¬ Acquire This Volume
No coin nor oath required. For personal study only.
β¦ Table of Contents
Content:
Front Matter, Page iii
Copyright, Page iv
Contributors, Pages vii-viii
Preface, Page ix, J.F. Ziegler
THE STOPPING AND RANGE OF IONS IN SOLIDS, Pages 3-61, J.F. Ziegler
ION IMPLANTATION DAMAGE IN SILICON, Pages 63-92, Siegfried Mader
EXPERIMENTAL ANNEALING AND ACTIVATION, Pages 93-163, JOZSEF GYULAI
MEASUREMENT OF ION IMPLANTATION, Pages 165-218, P.L.F. Hemment
An INTRODUCTION TO ION SOURCES, Pages 221-289, Ken G. Stephens
ION OPTICS AND FOCUSSING IN IMPLANTER DESIGN, Pages 291-312, Kenneth H. Purser, Nicholas R. White
Wafer Cooling, Faraday Design and Wafer Charging, Pages 313-344, M.E. Mack
PHOTORESIST PROBLEMS AND PARTICLE CONTAMINATION, Pages 345-375, T.C. Smith
Ion Implantation Diagnostics and Process Control, Pages 377-413, M.I. Current, C.B. Yarling, W.A. Keenan
SAFETY CONSIDERATIONS FOR ION IMPLANTERS, Pages 415-439, H. Ryssel, P. Hamers
EMISSION OF IONIZING RADIATION FROM ION IMPLANTERS, Pages 441-489, Constantine J. Maletskos, William R. Ghen
INDEX, Pages 491-498
π SIMILAR VOLUMES
Ion Implantation in Semiconductors: Scie
β F. H. Eisen (auth.), Susumu Namba (eds.)
π Library
π
1975
π Springer US
π English
<p>The technique of ion implantation has become a very useful and stable technique in the field of semiconductor device fabrication. This use of ion implantation is being adopted by industry. Another important application is the fundamental study of the physical properties of materials. The First Co
Ion Implantation Technologyβ92
β D.F. Downey, M. Farley, K.S. Jones and G. Ryding (Eds.)
π Library
π
1993
π North-Holland
π English
Ion implantation technology has made a major contribution to the advanced in integrated circuit technology since the early 1970s. The ever-present need for accurate models in ion implanted species will become vital in the future due to shrinking feature sizes. Successful wide application of ion impl
Ion Impantation Technology: 16th Interna
β Karen J. Kirkby, Russell Gwilliam, Andy Smith, David Chivers
π Library
π
2006
π American Inst. of Physics
π English
This is the premier world conference for the presentation of the latest advances in ion implantation, from the fundamentals of ion-solid interactions to manufacturing implant equipment. All papers were peer-reviewed. Ion implantation is used to manufacture semiconductor devices. Materials properties
Silicon Technologies: Ion Implantation a
π Library
π English
Content: <br>Chapter 1 Silicon and Silicon Carbide Oxidation (pages 1β101): Jean?Jacques Ganem and Isabelle Trimaille<br>Chapter 2 Ion Implantation (pages 103β153): Jean?Jacques Grob<br>Chapter 3 Dopant Diffusion: Modeling and Technological Challenges (pages 155β207): Daniel Mathiot<br>Chapter 4 Epi
Ion Exchange: Science and Technology
β Gerhard Klein (auth.), AlΓrio E. Rodrigues (eds.)
π Library
π
1986
π Springer Netherlands
π English