Ion implantation produces high-strength aluminium alloys
โ Scribed by David Follstaedt
- Publisher
- Elsevier Science
- Year
- 1992
- Weight
- 192 KB
- Volume
- 13
- Category
- Article
- ISSN
- 0261-3069
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๐ SIMILAR VOLUMES
Recent advances in high dose ion implantation The surface properties such as depth profile, techniques have produced silicon-on-insulator chemical bond and structure, and electrical prop-(SOI) substrates for the fabrication of electronic erties of oxide and nitride layers in aluminium devices. Oxyge
the pH range between 4 and 9 [1 ]. This behaviour Nitrogen-implanted aluminium is reported to is better than that deducible from the electroshow a better pitting corrosion resistance. Howchemical series and is due to the formation of an ever, the corrosion behaviour depends on the insoluble and prot