Electrochemical study of multiple-energy nitrogen-ion-implanted aluminium alloys

✍ Scribed by Y Massiani; J.P Crousier; L Fedrizzi; S Gialanella; P.L Bonora

• Publisher: Elsevier Science
• Year: 1989
• Tongue: English
• Weight: 430 KB
• Volume: 116
• Category: Article
• ISSN: 0921-5093
• DOI: 10.1016/0921-5093(89)90127-5

✦ Synopsis

the pH range between 4 and 9 [1 ]. This behaviour Nitrogen-implanted aluminium is reported to is better than that deducible from the electroshow a better pitting corrosion resistance. Howchemical series and is due to the formation of an ever, the corrosion behaviour depends on the insoluble and protective layer of aluminium number of nitrogen atoms available on the surface hydroxide. However, the aluminium corrosion and the thickness of the implanted layer. In singlerate increases noticeably when the pH value energy implantations the number of nitrogen changes from the near neutral conditions. In fact, atoms available on the surface is less than that in in these cases the aluminium hydroxide does not the bulk because of the Gaussian nature of the become a more protective layer. depth profile obtained. To overcome this difficulty,

In the last few years many papers [2, 3] have shown that ion implantation is very effective in we decided to obtain a thick implanted layer and a flat depth profile by using multiple-energy implanimproving the corrosion resistance of pure alutations. Aluminium specimens were implanted minium in the case of localized attack, modifying witl:t N ÷ ions in energy steps of 80, 35 and 15 ke V the aluminium oxide growth. Yet very few investi-