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Ion Implantation as a Tool to Control Properties of Amorphous Hydrogenated Silicon

✍ Scribed by Vavilov, V. S. ;Akimchenko, I. P. ;Krasnopevtsev, V. V.


Publisher
John Wiley and Sons
Year
1986
Tongue
English
Weight
494 KB
Volume
94
Category
Article
ISSN
0031-8965

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## Abstract TiAl‐based Intermetallic alloys are being considered as structural materials for high‐temperature applications due to their low density and substantial mechanical strength at high temperatures. The effect of various elements added by ion implantation on the oxidation behaviour of near‐γ