Ion implantation and ion beam analysis of MOD deposited oxide films
โ Scribed by X. Marko; P. Talagala; M.B. Sahana; R. Naik; K.R. Padmanabhan; C.P. Marques; E. Alves
- Book ID
- 108224045
- Publisher
- Elsevier Science
- Year
- 2007
- Tongue
- English
- Weight
- 294 KB
- Volume
- 261
- Category
- Article
- ISSN
- 0168-583X
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of Ti to a few percent. Pre-evaporation of a 300 ,~ thick CaF.~ parting layer allowed membrane removal by water-assisted peeling. Pressure testing showed membranes to have bulk tensile strength of 4.6-6.2,'< l09 dyn/cm 2 (68-92 kpsi) and to behave elastically. They could be mounted under high tensio
of Ti to a few percent. Pre-evaporation of a 300 ,~ thick CaF.~ parting layer allowed membrane removal by water-assisted peeling. Pressure testing showed membranes to have bulk tensile strength of 4.6-6.2,'< l09 dyn/cm 2 (68-92 kpsi) and to behave elastically. They could be mounted under high tensio