Ion beams in materials processing and analysis

✍ Scribed by Bernd Schmidt, Klaus Wetzig

• Publisher: Springer
• Year: 2012
• Tongue: English
• Leaves: 424
• Category: Library

✦ Synopsis

• Offers comprehensive treatment of the use of ion beams in material science research
• Includes numerous tables, graphs and illustrations that amplify the text
• Provides optimization strategies for solid-state properties of functional materials

A comprehensive review of ion beam application in modern materials research is provided, including the basics of ion beam physics and technology. The physics of ion-solid interactions for ion implantation, ion beam synthesis, sputtering and nano-patterning is treated in detail. Its applications in materials research, development and analysis, developments of special techniques and interaction mechanisms of ion beams with solid state matter result in the optimization of new material properties, which are discussed thoroughly. Solid-state properties optimization for functional materials such as doped semiconductors and metal layers for nano-electronics, metal alloys, and nano-patterned surfaces is demonstrated. The ion beam is an important tool for both materials processing and analysis. Researchers engaged in solid-state physics and materials research, engineers and technologists in the field of modern functional materials will welcome this text.

✦ Table of Contents

Preface......Page 5
Contents......Page 7
1: Introduction......Page 11
2.1 Fundamental Principles......Page 16
2.2 Binary Elastic Collisions......Page 17
2.3 Ion Stopping......Page 20
2.4 Ion Channeling......Page 24
2.5.1 Ion Implantation......Page 30
2.5.2 Ion Mixing......Page 33
2.5.3 Ion Sputtering......Page 36
References......Page 37
3: Ion Beam Technology......Page 41
3.1 Principles of Ion Acceleration......Page 42
3.1.1 Low Energy Ion Accelerators (Ion Implanters)......Page 44
3.1.2 High Energy Ion Accelerators......Page 46
3.2 Ion Sources......Page 48
3.2.1 Hot Filament (Hot Cathode) Ion Sources......Page 49
3.2.2 Cold Cathode Ion Source (Penning Ion Source)......Page 51
3.2.3 High Frequency (RF) Ion Source......Page 52
3.2.4 Duoplasmatron Ion Source......Page 53
3.2.5 Ion Sources for Electrostatic Accelerators......Page 54
3.2.6 Cesium Sputtering Ion Source......Page 55
3.2.7 Field Evaporation or Liquid Metal Ion Sources......Page 56
3.2.8 Beam Extraction from Ion Sources......Page 60
3.3 Ion Acceleration......Page 63
3.4.1 Ion Mass Separation......Page 66
3.4.2 Ion Beam Focusing......Page 69
3.4.3 Ion Beam Scanning......Page 71
3.4.4 Ion Beam Current Measurement......Page 73
3.4.5 Ion Detection (Detectors, Spectrometers)......Page 76
3.5 Ion Implantation Systems......Page 82
3.5.1 Common Low Energy Beam Line Implanters......Page 83
3.5.2 Specialized Low Energy Beam Line Implanters......Page 92
3.5.3 High Energy Beam Line Implanters......Page 94
3.5.4 Plasma-Based Ion Implanters......Page 97
3.6 Electrostatic Ion Accelerator Systems......Page 99
3.6.1 Single-Stage Electrostatic Accelerators......Page 100
3.6.2 Two-Stage Electrostatic Accelerators......Page 107
3.7.1 Low Energy Focused Ion Beams......Page 111
3.7.2 High Energy Focused Ion Beams......Page 117
References......Page 118
4.1 Ion Irradiation Effects in Crystalline Materials......Page 125
4.1.1 Depth Profiles and Ion Channeling......Page 126
4.1.2 Implantation-Induced Crystal Damage......Page 130
4.1.3 Sputtering Effects and Implanted Profile Change......Page 133
4.1.4 Radiation Damage Annealing......Page 139
4.2.1 Ion Implantation into Silicon......Page 149
4.2.2 Ion Implantation into Germanium......Page 166
4.2.3 Ion Implantation into Compound Semiconductors......Page 170
4.3 Ion Beam Synthesis of New Phases in Solids......Page 176
4.3.1 Buried Insulating Layers in Silicon......Page 180
4.3.2 Ion Beam-Synthesized Silicide Layers......Page 184
4.3.3 Ion Beam Synthesis of Nanocrystals in Insulators......Page 191
4.4 Ion Beam Mixing of Interfaces......Page 211
4.5 Ion Beam Slicing of Thin Layers (Smart-Cut for SOI and Solar Cells)......Page 217
4.6 Ion Beam Erosion, Sputtering, and Surface Patterning (Ripples and Dots)......Page 221
4.7 Ion Beam Shaping of Nanomaterials......Page 226
4.8 Ion Beam Processing of Other Materials......Page 235
4.8.1 Ion Implantation into Metals......Page 236
4.8.2 Ion Implantation into Polymers......Page 239
4.8.3 Ion Implantation into Insulating Optical Materials......Page 241
References......Page 243
5.1 Removal of Target Atoms by Sputtering......Page 260
5.2 Effects on Sputtering Yield......Page 262
5.2.1 Ion Energy and Ion Atomic Number......Page 263
5.2.2 Ion Incident Direction......Page 265
5.2.3 Selective Sputtering Due to Ion Channeling......Page 266
5.2.4 Target Material......Page 268
5.2.5 Preferential Sputtering......Page 271
5.3 Preparation Steps by Ion Beam Irradiation......Page 273
5.3.1 Ion Beam-Induced Cleaning and Etching......Page 274
5.3.2 Ion Beam-Induced Material Deposition......Page 277
5.3.3 Ion Beam-Induced Depth Profiling......Page 279
5.3.4 Ion Beam Cutting......Page 285
5.3.5 Ion Beam Thinning......Page 289
5.4 Focused Ion Beam Preparation......Page 293
5.4.1 FIB-Induced Cross-Section Preparation......Page 295
5.4.2 FIB-Based Thin Film Preparation......Page 298
5.4.3 Limiting Effects at FIB Preparation......Page 302
References......Page 305
6.1 Introduction......Page 308
6.2 Ion Beam Analytical Techniques: A Survey......Page 314
6.3.1 Rutherford Backscattering......Page 319
6.3.2 Medium-Energy Ion Scattering......Page 331
6.3.3 Low-Energy Ion Scattering......Page 333
6.3.4 Elastic Recoil Detection Analysis......Page 337
6.4 Ion Beam-Induced Photon Emission......Page 344
6.4.1 Particle-Induced X-Ray Emission......Page 345
6.4.2 Particle-Induced gamma-Ray Emission......Page 350
6.5 Nuclear Reaction Analysis......Page 351
6.6 Ion Beam-Induced Electron and Light Emission......Page 357
6.7 Secondary Ion Emission......Page 359
6.7.1 Dynamic Secondary Ion Mass Spectrometry (Dynamic SIMS)......Page 362
6.7.2 Static Secondary Ion Mass Spectrometry (Static SIMS)......Page 366
6.7.3 Sputtered Neutral Particle Mass Spectrometry......Page 368
6.8 Ion Beam Imaging Techniques......Page 370
6.8.1 Field Ion Microscopy......Page 371
6.8.2 Ion Microscopy with Stationary Ion Beam......Page 374
6.8.3 Scanning Ion Microscopy......Page 376
References......Page 379
7.1.1 Direct Study of Diffusion Processes in Amorphous Thin Layer Systems......Page 384
7.1.2 Nanoanalytical Investigations of Tunnel Magnetoresistance Layers......Page 388
7.2 Ion Beam Analysis in Art and Archeometry......Page 394
7.3 Special Applications in Life Sciences......Page 407
References......Page 415
Index......Page 419