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Ion beam technology applied to thin film deposition

โœ Scribed by J. Franks

Publisher
Elsevier Science
Year
1981
Tongue
English
Weight
673 KB
Volume
86
Category
Article
ISSN
0040-6090

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An ion beam deposition system to produce isotopically pure epitaxial thin films of different materials has been designed and built. Using negative ions, problems due to mass interference with molecular ions could be significantly reduced, thus allowing the production, for instance, of 29 Si films of