Ion-beam induced sequential epitaxy of α, β and γ-FeSi2 in Si (100) at 320°C

✍ Scribed by R.L. Maltez; M. Behar; X.W. Lin

• Book ID: 113286838
• Publisher: Elsevier Science
• Year: 1995
• Tongue: English
• Weight: 408 KB
• Volume: 106
• Category: Article
• ISSN: 0168-583X
• DOI: 10.1016/0168-583x(95)00739-3