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Ion beam analysis of the dry thermal oxidation of thin polycrystalline SiGe films

✍ Scribed by A. Kling; J.C. Soares; A.C. Prieto; J. Jiménez; A. Rodríguez; J. Sangrador; T. Rodríguez


Publisher
Elsevier Science
Year
2005
Tongue
English
Weight
284 KB
Volume
240
Category
Article
ISSN
0168-583X

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Ion beam analysis of PECVD silicon oxide
✍ F. Fernandez-Lima; J.A. Rodriguez; E. Pedrero; H.D. Fonseca Filho; A. Llovera; M 📂 Article 📅 2006 🏛 Elsevier Science 🌐 English ⚖ 202 KB

A study of ion beam analysis techniques of plasma enhanced chemical vapor deposited (PECVD) silicon oxide thin films (1 lm thick) obtained from silane (SiH 4 ) and nitrous oxide (N 2 O) is reported. The film, elemental composition and surface morphology were determined as function of the reactant ga