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Investigations on electrical properties of a-C:H thin films deposited in a Microwave Multipolar Plasma reactor excited at Distributed Electron Cyclotron Resonance

✍ Scribed by Kihel, M.; Clergereaux, R.; Escaich, D.; Calafat, M.; Raynaud, P.; Sahli, S.; Segui, Y.

Book ID: 123207494
Publisher: Elsevier Science
Year: 2008
Tongue: English
Weight: 366 KB
Volume: 17
Category: Article
ISSN: 0925-9635
DOI: 10.1016/j.diamond.2008.01.036

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