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Investigation of work function tuning using multiple layer metal gate electrodes stacks for complementary metal-oxide-semiconductor applications

✍ Scribed by Jha, Rashmi; Lee, JaeHoon; Majhi, Prashant; Misra, Veena

Book ID: 117997104
Publisher: American Institute of Physics
Year: 2005
Tongue: English
Weight: 298 KB
Volume: 87
Category: Article
ISSN: 0003-6951
DOI: 10.1063/1.2136425

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